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FORMATION OF ULTRA-SHALLOW JUNCTIONS BY PLASMA DOPING

著者名:
TSUTSUl, KAZUO 1
SASAKI, YUICHIRO 2
JlN, CHENG-GUO 2
TAMURA, HlDEKI 2
OKASHITA, KATSUM 2
ITO, HlROYUKI 2
MlZUNO, BUNJl 2
SAUDDIN, HENDRIANSYAH 2,3,
MAJIMA, KENTA 1
SATOH, TAKAHISA 3
FUKAGAWA, YOTARO 1
KAKUSHIMA, KUNIYUKl 1
IWAI, HlROSHI 3
さらに 8 件
掲載資料名:
Semiconductor technology (ISTC 2006) : proceedings of the 5th International Conference on Semiconductor Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2006-03
発行年:
2006
開始ページ:
232
終了ページ:
241
総ページ数:
10
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774376 [1566774373]
言語:
英語
請求記号:
E23400/200603
資料種別:
国際会議録

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