Blank Cover Image

STRAINED-SOI (SSOI) AND MOBILITY ENHANCEMENT TECHNOLOGIES FOR HIGH PERFORMANCE MOSFETS IN 45NM-NODE AND BELOW

著者名:
掲載資料名:
Semiconductor technology (ISTC 2006) : proceedings of the 5th International Conference on Semiconductor Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2006-03
発行年:
2006
開始ページ:
1
終了ページ:
7
総ページ数:
7
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774376 [1566774373]
言語:
英語
請求記号:
E23400/200603
資料種別:
国際会議録

類似資料:

1 国際会議録 Applications of Bonding SOI Technology to High Performance LSI Circuits

Yoshimi, M., Letertre, F., Cayrefourcq, I., Mazure, C.(Invited)

Electrochemical Society
7 国際会議録 Optical performance enhancement technique for 45-nm-node with binary mask

J. Jung, H. Kim, J. Lee, S. Choi, W. Han

SPIE - The International Society of Optical Engineering
2 国際会議録 Improvement of mask CD uniformity for below 45-nm node technology

H. Lee, S. Bae, J. Park, D. Nam, B. Kim

Society of Photo-optical Instrumentation Engineers
8 国際会議録 Optical performance enhancement technique for 45-nm node with binary mask

J. -S. Jung, H. -B. Kim, J. -W. Lee, S. G. Woo, H. -K. Cho

SPIE - The International Society of Optical Engineering
3 国際会議録 Mobility enhancement through substrate engineering Invited

Cayrefourcq, I., Kennard, M., Metral, F., Mazure, C., Thean, A., Sadaka, M., White, T., Nguyen, B.Y.

Electrochemical Society
9 国際会議録 Effects of photo resist erosion in development on critical dimension performance for 45nm node and below

G.-H. Hwang, D.-H. Kim, C. Yu, B.-S. Kang, I.-B. Hur

Society of Photo-optical Instrumentation Engineers
4 国際会議録 Evaluation of ultra-thin double gate MOSFETs for the 45 nm technology node

Barin, N., Fiegna, C., Esseni, D., Sangiorgi, E.

Electrochemical Society
10 国際会議録 Thin film transfer by Smart Cut technology beyond SOI

Mazure, C.

Electrochemical Society
5 国際会議録 High performance SOI technology for sub-45nm gate length CMOS manufacturing Invited

Horstmann, M., Greenlaw, D., Huebler, P., Stephan, R., Feudel, Th., Wei, A., Frohberg, K., Hoentschel, J., Javorka, P., …

Electrochemical Society
11 国際会議録 Intrinsic Advantages of SOI Multiple-Gate MOSFET (MuGFET) for Low Power Applications

W. W. Xiong, C. Cleavelin, C. Hsu, M. Ma, K. Schruefer, K. Von Arnim, T. Schulz, I. Cayrefourcq, C. Mazure, P. Patruno, …

Electrochemical Society
6 国際会議録 Mask enhancer technology for 45-nm node contact hole fabrication

Yuito, T., Wiaux, V., Look, L. Van, Vandenberghe, G., Irie, S., Matsuo, T., Misaka, A., Watanabe, H., Sasago, M.

SPIE - The International Society of Optical Engineering
12 国際会議録 High transmission mask technology for 45nm node imaging

Irisawa, J., Okazoe, T., Eriguchi, T., Yokokoji, O.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12