(6.3) 11:35 - 11:55 AM - Schottky Barrier Height Engineering with a Strained-Si channel for Sub-50nm Gate Schottky Source/Drain MOSFETs
- 著者名:
- 掲載資料名:
- SiGe: materials, processing, and devices : proceedings of the First international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2004-07
- 発行年:
- 2004
- 開始ページ:
- 471
- 終了ページ:
- 482
- 総ページ数:
- 12
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774208 [1566774209]
- 言語:
- 英語
- 請求記号:
- E23400/200407
- 資料種別:
- 国際会議録
類似資料:
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3
国際会議録
Enhanced Short-Channel Effects of Sub-50 nm Gate Length MOSFETs with High-k Gate Insulator Films
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国際会議録
(6.5) 12:15 - 12:35 PM - Design, Fabrication and Operation of Sub-65nm Strained-Si/Si1_xGex MOSFETS
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