Impact of STI Width and Spacing on the Stress Generation in Deep Submicron CMOS
- 著者名:
- 掲載資料名:
- High purity silicon VIII : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2004-05
- 発行年:
- 2004
- 開始ページ:
- 307
- 終了ページ:
- 316
- 総ページ数:
- 10
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774185 [1566774187]
- 言語:
- 英語
- 請求記号:
- E23400/200405
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society | |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
9
国際会議録
Electrical Performance and Reliability Aspects of Strain Engineered Deep Submicron CMOS Technologies
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society, SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |