Characteristics of Self-Assembled Ultra-Low-k Porous Silica Films
- 著者名:
Oku, Y. Fujii, N. Kohmura, K. Yamada, K. Hata, N. Seine, Y. Ichikawa, R. Nishiyama, N. Tanaka, S. Miyoshi, H. Oike, S. Tanaka, H. Takada, S. Negoro, C. Nakano, A. Rang, H. -K. Suh, K. -P. - 掲載資料名:
- Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2004-04
- 発行年:
- 2004
- 開始ページ:
- 331
- 終了ページ:
- 345
- 総ページ数:
- 15
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774178 [1566774179]
- 言語:
- 英語
- 請求記号:
- E23400/200404
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
A Novel Organosiloxane Vapor Annealing Process for Improving Elastic Modulus of Porous Low-k Films
Materials Research Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Materials Research Society |
American Institute of Aeronautics and Astronautics |
Materials Research Society |
American Institute of Aeronautics and Astronautics |
6
国際会議録
Fabrication of mesoporous silica for ultra-low-k interlayer dielectrics (Invited Paper) [6002-24]
SPIE - The International Society of Optical Engineering |
American Institute of Aeronautics and Astronautics |