On the impact of high-K properties (and defects) on MOSFET el ectrical characteristics (invited paper)
- 著者名:
Pantisano, L. Afanas'ev, V. Ragnarsson, L-A. Houssa, M. Degraeve, R. Groeseneken, G. Schram, T. DeGendt, S. Heyns, M. - 掲載資料名:
- Crystalline defects and contamination: their impact and control in device manufacturing IV : DECON 2005 : proceedings of the Satellite Symposium to ESSDERC 2005, Grenoble, France
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2005-10
- 発行年:
- 2005
- 開始ページ:
- 144
- 終了ページ:
- 158
- 総ページ数:
- 15
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774284 [1566774284]
- 言語:
- 英語
- 請求記号:
- E23400/200510
- 資料種別:
- 国際会議録
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3
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13 High-k Gate Stack Engineering - towards Meeting Low Standby Power and High Performance Targets
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