Blank Cover Image

Deposition of undoped and in-situ doped amorphous and polycrystalline silicon with LPCVD

著者名:
掲載資料名:
EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2005-09
発行年:
2005
開始ページ:
652
終了ページ:
658
総ページ数:
7
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774277 [1566774276]
言語:
英語
請求記号:
E23400/200509
資料種別:
国際会議録

類似資料:

1 国際会議録 The Deposition of Polycrystalline SiGe with Different Ge Precursors

X. Shi, M. Schaekers, F. Leys, R. Loo, M.R. Caymax

Electrochemical Society
7 国際会議録 Low Temperature Silcore Deposition of Undoped and Doped Silicon Films

P. R. Fischer, S. Van Aerde, E. Oosterlaken, B. Bozon, P. M. Zagwnjn, M. Bauer, M. Yan, W. Verweij

Electrochemical Society
2 国際会議録 Characterization of LOW Stress, Undoped LPCVD Polycrystalline SiC Films for MEMS Applications

Dunning, J., Fu, X.A., Mehregany, M., Zorman, C.A.

Trans Tech Publications
8 国際会議録 IN SITU HREM OBSERVATIONS OF CRYSTALLIZATION IN LPCVD AMORPHOUS SILICON

Morgiel, J., Wu, I. W., Chiang, A., Sinclair, R.

Materials Research Society
3 国際会議録 Optical Properties of Undoped, Phosphorous Doped and Oxidized LPCVD Polycrystalline Silicon Films Obtained by Transmission and FTIR Measurements

Davazoglou, D., Kouvatsos, D., Valamontes, E.

Electrochemical Society
9 国際会議録 Characterization of Undoped and In Situ Phosphorous- Doped Amorphous Silicon Films for Integrated Circuit Manufacturing

Nanda, A.K., Felton, G.J.

Electrochemical Society
4 国際会議録 PROPERTIES OF IN SITU DOPED AMORPHOUS AND POLYCRYSTALLINE SILICON DEPOSITED BY CHEMICAL VAPOR DEPOSITION FROM TERTIARYBUTYLARSINE AND TERTIARYBUTYLPHOSPHINE

Kotecki, David E., Blouse, Jeffrey L., Parks, Christopher C., Sarkozy, Robert F.

Materials Research Society
10 国際会議録 Hydrogen Diffusion in Polycrystalline Boron Doped and Undoped Diamond

Ballutaud, D., Bouty-Forveille, A., Laroche, J.-M., Simon, N., Girard, H., Herlem, M., Etcheberry, A.

Materials Research Society
5 国際会議録 ON THE ADHESION OF LPCVD WSi2 TO DOPED AND UNDOPED POLYSILICON

Shenai, K., Piacente, P.A., Lewis, N., McConnell, M.D., Smith, G.A., Baliga, B.J.

Materials Research Society
11 国際会議録 Optical properties of Nd doped and undoped polycrystalline YAG

M. E. Thomas, A. K. Carr, D. Limsui, J. C. Huie

SPIE - The International Society of Optical Engineering
6 国際会議録 Deposition and characterization of in situ boron doped polycrystalline silicon films for microelectromechanical systems applications

McMahon, J. J., Melzak, J. M., Zorman, C. A., Chung, J., Mehregany, M.

MRS-Materials Research Society
12 国際会議録 Deposition of LPCVD Amorphous Silicon Thin Films With a Low Content of Germanium: Crystallization and Electrical Characteristics

Briand, D., Kis-Sion, K., Mohammed-Brahim, T., Sarret, M., Le Bihan, F., Haji, L., Bonnaud, O.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12