Blank Cover Image

Silicon Microstructures: 3-D Micromachining with KOH Solution

著者名:
掲載資料名:
Microelectronics technology and devices : SBMICRO 2005 : proceedings of the twentieth international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2005-08
発行年:
2005
開始ページ:
398
終了ページ:
407
総ページ数:
10
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774260 [1566774268]
言語:
英語
請求記号:
E23400/200508
資料種別:
国際会議録

類似資料:

1 国際会議録 Deep Anisotropic Etching of Silicon with Smooth Surface for Micromachining Applications

Moshkalyov, S.A., Reyes-Betanzo, C., Swart, J.W.

Electrochemical Society
7 国際会議録 Reflectivity of micromachined{111}-oriented silicon mirrors for optical input/output couplers

Sadler,D.J., Garter,M.J., Ahn,C.H., Koh,S., Cook,A.L.

SPIE-The International Society for Optical Engineering
2 国際会議録 Electrical Characterization of a-C:H as Insulator Material in MIM Structures

C. Zuniga-I, A. I. Kosarel, A. Torres-J, C. Reyes-Betanzo, W. Calleja-A, P. Rosales

Electrochemical Society
8 国際会議録 Synthesis of Carbon Nanotubes by Plasma-Enhanced Chemical Vapor Deposition

Moshkalyov, S.A., Reyes-Betanzo, C., Swart, J.W., Ramos, A.C.S.

Electrochemical Society
3 国際会議録 Selective Silicon Nitride Etching by ECR Plasmas Using SF6 and NF3 Based Gas Mixtures

Reyes-Betanzo, C., Moshkalyov, S.A., Swart, J.W., Ramos, A.C.S.

Electrochemical Society
9 国際会議録 Reactive Ion Etching of SiGe Using Halogen-Based Plasmas

Reyes-Betanzo, C., Moshkalyov, S. A.

Electrochemical Society
4 国際会議録 Fabrication of Submicron Structures in Polycristalline Silicon by Reactive Ion Etching Using Fluorine- and Chlorine- Containing Plasmas

Reyes-Betanzo, C., Moshkalyov, S.A., Seabra, A.C., Swart, J.W.

Electrochemical Society
10 国際会議録 Nucleation of p-Type Microcrystalline Silicon on Amorphous Silicon for n-i-p Solar Cells Using B(CH3)3 and BF3 Dopant Source Gases

Koh, Joohyun, Fujiwara, H., Koval, R. J., Wronski, C. R., Collins, R. W.

MRS - Materials Research Society
5 国際会議録 Study of Power Balance in Asymmetric Capacitively Coupled Discharge Plasmas used for Material Processing

Moshkalyov, S.A., Reyes-Betanzo, C., Swart, J.W.

Electrochemical Society
11 国際会議録 Micromachined silicon optical bench for the low-cost optical module

Song,K.-C., Bu,J.-U., Jeon,Y.-S., Park,C.-K., Jeong,J.-H., Koh,H.-J., Choi,M.-H.

SPIE - The International Society for Optical Engineering
6 国際会議録 Effect of Oxygen and Nitrogen Additions on Silicon Nitride Reactive Ion Etching in Fluorine Containing Plasmas

Reyes-Betanzo, C., Moshkalyov, S.A., Ramos, A.C.S., Cotta, M.A., Swart, J.W.

Electrochemical Society
12 国際会議録 Excimer micromachining for texturing silicon solar cells

Ortabasi,U., Meier,D.L., Easoz,J.R., Schaeffer,R.D., Stepanova,M.A., Ho,W., Stokes,J.A., Dummer,R.S., Jafolla,J.C., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12