50 Characterization of the Effect of High-k Process Conditions on the Performance of Flash Memory by a DOE Method
- 著者名:
Jean, J. Shiraiwa, H. Orimoto, T. Zheng, W. Suh, Y. Ding, M. Chan, S. Sachar, H. Torii, S. Xue, L. Randolph, M. Ogle, B. Raisanen, P. - 掲載資料名:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2005-05
- 発行年:
- 2005
- 開始ページ:
- 411
- 終了ページ:
- 417
- 総ページ数:
- 7
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774635 [1566774632]
- 言語:
- 英語
- 請求記号:
- E23400/200505
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering | |
MRS - Materials Research Society |
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(38a) Soft Hydrogel Microparticles of Controlled Size and Stiffness with An Emulsion-Based Method
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