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Growth of Silicon Suboxide Layer Above An Atomically Abrupt SiO2/Si(100) Interface in Conventional Furnace Oxynitridation Using N2O Ambients

著者名:
Pennycook, Stephen J. ( Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN )
Browning, Nigel D. ( University of Illinois at Chicago, Chicago, IL )
Dang, SANJIT S. ( University of Illinois at Chicago, Chicago, IL )
Duscher, GERD ( University of Illinois at Chicago, Chicago, IL )
Rupangudi, Ramana V. ( University of Illinois at Chicago, Chicago, IL )
Takoudis, Christos G. ( University of Illinois at Chicago, Chicago, IL )
Trenary, Michael ( University of Illinois at Chicago, Chicago, IL )
さらに 2 件
掲載資料名:
AIChE 1998 ANNUAL MEETING
シリーズ名:
AIChE meeting [papers]
シリーズ巻号:
1998
発行年:
1998
ペーパー番号:
103l
総ページ数:
2
出版情報:
New York: American Institute of Chemical Engineers
言語:
英語
請求記号:
A08000
資料種別:
国際会議録

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