Influence of Substrate Placement on Plasma-Assisted Chemical Vapor Deposition of Diamond
- 著者名:
- Koemtzopoulos, C.R. ( University of Houston, Houston, TX )
- Economou, D.J. ( University of Houston, Houston, TX )
- Pollard, R. ( University of Houston, Houston, TX )
- 掲載資料名:
- AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California
- シリーズ名:
- AIChE meeting [papers]
- シリーズ巻号:
- 1994
- 発行年:
- 1994
- ペーパー番号:
- 19g
- 総ページ数:
- 5
- 出版情報:
- New York: American Institute of Chemical Engineers
- 言語:
- 英語
- 請求記号:
- A08000/950031
- 資料種別:
- 国際会議録
類似資料:
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8
国際会議録
Chemical vapor deposition of Aluminum and Gallium Nitride thin films from metal organic precursors
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