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Deposition of Poly-Si by Remote Plasma CVD with Si2H6-SiF4

著者名:
  • Rhee, S.-W. ( Department of Chemical Engineering, Laboratory for Advanced Materials Processing, Pohang University of Science and Technology, Pohang, Korea )
  • Lee, I.-J. ( Department of Chemical Engineering, Laboratory for Advanced Materials Processing, Pohang University of Science and Technology, Pohang, Korea )
  • Kim, D.-H. ( Department of Chemical Engineering, Laboratory for Advanced Materials Processing, Pohang University of Science and Technology, Pohang, Korea )
掲載資料名:
AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California
シリーズ名:
AIChE meeting [papers]
シリーズ巻号:
1994
発行年:
1994
ペーパー番号:
18c
総ページ数:
7
出版情報:
New York: American Institute of Chemical Engineers
言語:
英語
請求記号:
A08000/950031
資料種別:
国際会議録

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