Blank Cover Image

Laser Diagnostics and Numerical Modelling of Si Atom Density During CVD from Silane

著者名:
  • Coltrin, M.E. ( Sandia National Laboratories, Albuquerque, NM )
  • Ho, P. ( Sandia National Laboratories, Albuquerque, NM )
  • Breiland, W.G. ( Sandia National Laboratories, Albuquerque, NM )
掲載資料名:
AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California
シリーズ名:
AIChE meeting [papers]
シリーズ巻号:
1994
発行年:
1994
ペーパー番号:
14d
総ページ数:
7
出版情報:
New York: American Institute of Chemical Engineers
言語:
英語
請求記号:
A08000/950031
資料種別:
国際会議録

類似資料:

1 国際会議録 Si Atom Density Profiles In a Rotating Disk CVD Reactor

Ho, P., Breiland, W.G., Coltrin, M.E.

Electrochemical Society
7 国際会議録 Normal Incidence Reflectance: A Robust Tool for In Situ Real-Time Measurement of Growth Rates and Optical Constants of CVD-Grown Semiconductor Thin Films

Breiland, W.G., Brennan, T.M., Chui, H.C., Hammons, B.E., Killeen, K.P.

Electrochemical Society
2 国際会議録 LASER-EXCITED FLOURESCENCE DETECTION OF Si2 DURING SILANE CVD

Breiland, W. G., Coltrin, M. E., Ho, P.

North-Holland
8 国際会議録 Numerical Modelling of Diamond Chemical Vapor Deposition (Invited)

Coltrin, M.E., Dandy, D.S.

American Institute of Chemical Engineers
3 国際会議録 GAS-PHASE SILICON ATOM DENSITIES IN THE CHEMICAL VAPOR DEPOSITION OF SILICON FROM SILANE

Coltrin, Michael E., Breiland, William G., Ho, Pauline

MRS - Materials Research Society
9 国際会議録 A Model for Low Pressure Chemical Vapor Deposition in Batch Furnaces

Houf, W.G., Grcar, J.F., Breiland, W.G.

Electrochemical Society
4 国際会議録 THEORETICAL MODELING AND LASER DIAGNOSTICS OF SILICON CHEMICAL VAPOR DEPOSITION

Coltrin, Michael. E., Breiland, William. G., Ho, Pauline

American Institute of Chemical Engineers
10 国際会議録 In Situ Growth Rate Measurements by Normal-Incidence Reflectance During MOVPE Growth

Hou, H.Q., Breiland, W.G., Hammons, B.E., Chui, H.C.

Electrochemical Society
5 国際会議録 Sources of the Parasitic Chemical Reactions during AlGaN OMPVE*

Creighton, J.R., Breiland, W.G., Coltrin, M.E.

Electrochemical Society
11 国際会議録 A MODEL FOR SILICON DENDRITE GROWTH DURING LASER/PLASMA DEPOSITION FROM A SILANE DISCHARGE

Anderson, H.M., Hargis, Jr., P.J.

Materials Research Society
6 国際会議録 *LASER PROBES AND NUMERICAL MODELING AS PROCESS DIAGNOSTICS IN CHEMICAL VAPOR DEPOSITION

Breiland, William G., Ho, Pauline, Coltrin, Michael E,, Kee, Robert J., Evans, Greg H.

Materials Research Society
12 国際会議録 Modeling Particle Nucleation during Thernaal CVD of Silicon from Silane using Kinetic Monte Carlo Sinsulation

Li, X., Swihart, M.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12