Etching of Silicon Oxide by HF/Solvent Mixtures Condensed from a Vapor Phase

Etching of Silicon Oxide by HF/Solvent Mixtures Condensed from a Vapor Phase

著者名:

Muscat, A.J. ( Massachusetts Institute of Technology, Cambridge, MA )
Lawing, A.S. ( Massachusetts Institute of Technology, Cambridge, MA )
Xu, H. ( Massachusetts Institute of Technology, Cambridge, MA )
Sawin, H.H. ( Massachusetts Institute of Technology, Cambridge, MA )

掲載資料名:

AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California

シリーズ名:

AIChE meeting [papers]

シリーズ巻号:

1994

発行年:

1994

ペーパー番号:

10d

総ページ数:

6

出版情報:

New York: American Institute of Chemical Engineers

言語:

英語

請求記号:

A08000/950031

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015159
シリーズID:	PA00000179
会議名:	AIChE Annual Meeting
回次:	1994
会議開催地:	San Francisco, CA, USA
会議開催年:	1994.11.13-1994.11.18
論文注記:	Fiche 28

類似資料:

1 国際会議録 CHARACTERIZATION OF SILICON OXIDE ETCHING IN GAS PHASE HF/VAPOR MIXTURES Muscat, Anthony J., Lawing, Scott A., Sawin, Herbert H., Butterbaugh, Jeff, Syverson, Dan, Hiatt, Fred Electrochemical Society	7 国際会議録 Characteristics of residual products in HF gas-phase etching of sacrificial oxides for silicon micromachining Jang,W.-I., Choi,C.-A., Lee,C.-S., Hong,Y.-S., Lee,J.-H. SPIE - The International Society for Optical Engineering
2 国際会議録 CHARACTERIZATION OF SILICON OXIDE ETCHING IN HF VAPOR PROCESSES Han, Y.-P., Lawing, S., Sawin, H. Electrochemical Society	8 国際会議録 UV/CL2 ETCHING AND CLEANING OF WAFER SURFACES Lawing, A. Scott, Muscat, Anthony J., Sawin, Herbert H., Butterbaugh, Jeffrey W. Electrochemical Society
3 国際会議録 Post Oxide Etching Cleaning Process Using Integrated Ashing and HF Vapor Process Kwon, O., Sawin, H. Electrochemical Society	9 国際会議録 Silicon surface micromachining by anhydrous HF gas-phase etching with methanol Jang,W.I., Choi,C.A., Lee,C.S., Hong,Y.S., Lee,J.H., Baek,J.T., Kim,B.W. SPIE-The International Society for Optical Engineering
4 国際会議録 Etching vs Deposition: The Effect on Profiles and Etching Yield Curves for Oxide Etching Kwon, O., Jin, W., Sawin, H.H. Electrochemical Society	10 国際会議録 Comparison between wet HF etching and vapor HF etching for sacrificial oxide removal Witvrouw,A., Bois,B.Du, Moor,P.De, Verbist,A., Hoof,C.A.Van, Bender,H., Baert,K. SPIE-The International Society for Optical Engineering
5 国際会議録 Plasma-Surface Kinetics and Feature Profile Evolution in Cl2 + HBr Etching of Poly-silicon Jin, W., Vitale, S.A., Sawin, H.H. Electrochemical Society	11 国際会議録 GAS-PHASE ETCHING OF SILICON OXiDE WITH ANHYDROUS HF AND ISOPROPANOL Butterbaugh, J.W., Hiatt, C.F., Gray, D.C. Electrochemical Society
6 国際会議録 Deep Reactive Ion Etching of Silicon Ayon, A.A., Chen, K-S., Lohner, K.A., Spearing, S.M., Sawin, H.H., Schmidt, M.A. Materials Research Society	12 国際会議録 Feature Profile Evolution during the High Density Plasma Etching of Patterned Polysilicon Mahorowala, A.P., Sawin, H.H. Electrochemical Society

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