A Low Pressure Reactor for Silver Catalyzed Ethylene Epoxidation

A Low Pressure Reactor for Silver Catalyzed Ethylene Epoxidation

著者名:

NOWOBILSKI, P.J. ( PURDUE UNIVERSITY, WEST LAFAYETTE, IN )
TAKOUDIS, C.G. ( PURDUE UNIVERSITY, WEST LAFAYETTE, IN )

掲載資料名:

AIChE ANNUAL MEETING, MIAMI BEACH, FL. -NOUVEMBER 2-7, 1986

シリーズ名:

AIChE meeting [papers]

シリーズ巻号:

1986

発行年:

1986

ペーパー番号:

83a

総ページ数:

16

出版情報:

New York: American Institute of Chemical Engineers

言語:

英語

請求記号:

A08000

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015136
シリーズID:	PA00000179
会議名:	AIChE Annual Meeting
回次:	1986
会議開催地:	Miami Beach, FL, USA
会議開催年:	1986.11.02-1986.11.07
論文注記:	Fiche 84

類似資料:

1 国際会議録 Characterizing oxygen adspecies for ethylene epoxidation over silver with the TAP reactor system Rigas, N. C., Gleaves, J. T., Mills, P. L. Elsevier	7 国際会議録 Metalloporphyrin-Catalyzed Epoxidation of Propylene Iwanejko, R., Leduc, P., Mlodnicka, T., Poltowicz, J. Elsevier
2 国際会議録 Activation of Silver Powder for Ethylene Epoxidation at Vacuum and Atmospheric Pressures Rigas, N. C., Svoboda, G. D., Gleaves, J. T. American Chemical Society	8 国際会議録 Detailed modeling of transport-kinetics interactions of ethylene epoxidation at high vacuum and atmospheric pressures Svoboda, G. D., Gleaves, J. T., Mills, P. L. Elsevier
3 国際会議録 Emission Infared Spectroscopy as an in-Situ Probe of CVD at High Gas Pressures: The Epitaxial Silicon CVD Christopher, P., Takoudis, C.G. Electrochemical Society	9 国際会議録 In-Situ Infrared Emission Spectroscopy During Silicon Chemical Vapor Deposition Takoudis. C.G., Panezyk, C. Electrochemical Society
4 国際会議録 Low Pressure Chemical Vapor Deposition of Epitaxial Silicon-Germanium, Epitaxial Silicon and Poly-Silicon Lee, I-M.R., Neudeck, G.W., Takoudis, C.G. Electrochemical Society	10 国際会議録 In Situ FTIR Emission Spectroscopy in Silicon Chemical Vapor Deposition on H-Terminated Si(111) and Si(100) Surfaces Panczyk, C., Takoudis, C.G. American Institute of Chemical Engineers
5 国際会議録 Selective Epitaxial Growth of SiGe Films in LPCVD Reactor Systems- Characterization of SiGe Films by Ellipsometry Lee, I.M., Wang, W.C., Koh, M.T.K., Denton, J.P., Takoudis, C.G., Kram, E.P., Neudeck, G.W. Electrochemical Society	11 国際会議録 Furnace Silicon Oxynitridation in Nitrous Oxide Ambients Singhvi, S., Takoudis, C.G. Electrochemical Society
6 国際会議録 Design and simulation of a vacuum micropump Cui,Z., Takoudis,C.G. SPIE-The International Society for Optical Engineering	12 国際会議録 Thermodynamic and Kinetic Studies of Si1-xGex Chemical Vapor Deposition Lee, I-M., Takoudis, C.G. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12