THEORETICAL MODELING AND LASER DIAGNOSTICS OF SILICON CHEMICAL VAPOR DEPOSITION

THEORETICAL MODELING AND LASER DIAGNOSTICS OF SILICON CHEMICAL VAPOR DEPOSITION

著者名:

Coltrin, Michael. E. ( Sandia National Laboratories )
Breiland, William. G. ( Sandia National Laboratories )
Ho, Pauline ( Sandia National Laboratories )

掲載資料名:

AIChE ANNUAL MEETING - CHICAGO, IL., NOVEMBER 10-15, 1985

シリーズ名:

AIChE meeting [papers]

シリーズ巻号:

1985

発行年:

1985

ペーパー番号:

88c

総ページ数:

6

出版情報:

New York: American Institute of Chemical Engineers

言語:

英語

請求記号:

A08000

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015134
シリーズID:	PA00000179
会議名:	AIChE Annual Meeting
回次:	1985
会議開催地:	Chicago, IL, USA
会議開催年:	1985.11.10-1985.11.15
論文注記:	Fiche 33

類似資料:

1 国際会議録 GAS-PHASE SILICON ATOM DENSITIES IN THE CHEMICAL VAPOR DEPOSITION OF SILICON FROM SILANE Coltrin, Michael E., Breiland, William G., Ho, Pauline MRS - Materials Research Society	7 国際会議録 Numerical Modelling of Diamond Chemical Vapor Deposition (Invited) Coltrin, M.E., Dandy, D.S. American Institute of Chemical Engineers
2 国際会議録 *LASER PROBES AND NUMERICAL MODELING AS PROCESS DIAGNOSTICS IN CHEMICAL VAPOR DEPOSITION Breiland, William G., Ho, Pauline, Coltrin, Michael E,, Kee, Robert J., Evans, Greg H. Materials Research Society	8 国際会議録 LASER STUDIES OF THE SiH RADICAL/SURFACE INTERACTION DURING DEPOSITION OF A THIN A THIN FILMS Ho, Pauline, Buss, Richard J., Breilsnd, William G. Materials Research Society
3 国際会議録 THEORETICAL ANALYSIS OF A ROTATING-DISK CHEMICAL VAPOR DEPOSITION REACTOR Coltrin, Michael E., Breiland, William G., Evans, Gregory H., Kee, Robert J. American Institute of Chemical Engineers	9 国際会議録 A Model for Low Pressure Chemical Vapor Deposition in Batch Furnaces Houf, W.G., Grcar, J.F., Breiland, W.G. Electrochemical Society
4 国際会議録 Laser Diagnostics and Numerical Modelling of Si Atom Density During CVD from Silane Coltrin, M.E., Ho, P., Breiland, W.G. American Institute of Chemical Engineers	10 国際会議録 MODELS OF TRANSPORT, GAS-PHASE, AND SURFACE CHEMISTRY IN DIAMOND CHEMICAL VAPOR DEPOSITION Dandy, D.S., Coltrin, M.E. Electrochemical Society
5 国際会議録 LASER-EXCITED FLOURESCENCE DETECTION OF Si2 DURING SILANE CVD Breiland, W. G., Coltrin, M. E., Ho, P. North-Holland	11 国際会議録 Chemical Kinetics Models for Semiconductor Processing Coltrin, Michael E., Meeks, Ellen, Grcar, Joseph F., Houf, William G., Kee, Robert J., Creighton, J. Randall MRS - Materials Research Society
6 国際会議録 Application of Supercomputers To Model Fluid Transport and Chemical Kinetics in Chemical Vapor Deposition Reactors Kee, Robert J., Evans, Greg H., Coltrin, Michael E. American Chemical Society	12 国際会議録 Si Atom Density Profiles In a Rotating Disk CVD Reactor Ho, P., Breiland, W.G., Coltrin, M.E. Electrochemical Society

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