DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI
- 著者名:
Hillmann, F. ( MueTec GmbH (Germany) ) Dobereiner, S. ( MueTec GmbH (Germany) ) Gittinger, C. ( MueTec GmbH (Germany) ) Reiter, R. ( MueTec GmbH (Germany) ) Falk, G. ( MueTec GmbH (Germany) ) Bruck, H.-J. ( MueTec GmbH (Germany) ) Scheuring, G. ( MueTec GmbH (Germany) ) Bosser, A. ( Leica Microsystems Semiconductor GmbH (Germany) ) Heiden, M. ( Leica Microsystems Semiconductor GmbH (Germany) ) Hoppen, G. ( Leica Microsystems Semiconductor GmbH (Germany) ) Sulik, W. ( Leica Microsystems Semiconductor GmbH (Germany) ) Voilrath, W. ( Leica Microsystems Semiconductor GmbH (Germany) ) - 掲載資料名:
- EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5835
- 発行年:
- 2005
- 開始ページ:
- 167
- 終了ページ:
- 177
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458308 [0819458309]
- 言語:
- 英語
- 請求記号:
- P63600/5835
- 資料種別:
- 国際会議録
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First results from a new 248-nm CD measurement system for future mask and reticle generation
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