Actual measurement data obtained on new 65nm generation mask metrology toot set

Actual measurement data obtained on new 65nm generation mask metrology toot set

著者名:

Bender, J. ( Leica Microsystems Semiconductor GmbH (Germany) )

Ferber, M. ( Leica Microsystems Semiconductor GmbH (Germany) )

Roth, K.-D. ( Leica Microsystems Semiconductor GmbH (Germany) )

Schluter, G. ( Leica Microsystems Semiconductor GmbH (Germany) )

Steinberg, W. ( Leica Microsystems Semiconductor GmbH (Germany) )

Scheuring, G. ( MueTec GmbH (Germany) )

Hillmann, F. ( MueTec GmbH (Germany) )

さらに 2 件

掲載資料名:

EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5835

発行年:

2005

開始ページ:

134

終了ページ:

144

総ページ数:

11

出版情報:

Bellingham, Wash.,: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458308 [0819458309]

言語:

英語

請求記号:

P63600/5835

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015067
シリーズID:	PA00000029
会議名:	EMLC : European Mask and Lithography Conference
回次:	2005 : 21st
会議開催地:	Dresden, Germany
会議開催年:	2005.01.31-2005.02.03

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