Progress in 193nm immersion lithography at IMEC

Progress in 193nm immersion lithography at IMEC

著者名:

Ronse, K. ( IMEC (Belgium) )
Vandenberghe, G. ( IMEC (Belgium) )
Hendrickx, E. ( IMEC (Belgium) )
Leunissen, L. H. A. ( IMEC (Belgium) )
Aksenov, Y. ( Philips Research Leuven (Belgium) )

掲載資料名:

EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5835

発行年:

2005

開始ページ:

6

終了ページ:

12

総ページ数:

7

出版情報:

Bellingham, Wash.,: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458308 [0819458309]

言語:

英語

請求記号:

P63600/5835

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015067
シリーズID:	PA00000029
会議名:	EMLC : European Mask and Lithography Conference
回次:	2005 : 21st
会議開催地:	Dresden, Germany
会議開催年:	2005.01.31-2005.02.03

類似資料:

1 国際会議録 Reticle quality needs for advanced 193-nm lithography Jonckheere,R.M., Vandenberghe,G.N., Wiaux,V., Verhaegen,S., Ronse,K. SPIE-The International Society for Optical Engineering	7 国際会議録 EUV lithography program at IMEC A. M. Goethals, R. Jonckheere, G. F. Lorusso, J. Hermans, F. V. Roey, A. Myers, M. Chandhok, I. Kim, A. Niroomand, F. … SPIE - The International Society of Optical Engineering
2 国際会議録 Status 157-nm lithography development at IMEC Ronse, K.G., Bisschop, P.D., Eliat, A., Goethals, A.M., Hermans, J., Jonckheere, R., Heuvel, D.V.D., Roey, F.V., Beckx, … SPIE-The International Society for Optical Engineering	8 国際会議録 Synthesis of high rrefractive index sulfur containing polymers for 193nm immersion lithography: a progress report [6153-69] Blakey, I, Conley, W, George, G A, Hill, D J, Liu, H, Whittaker, A K SPIE - The International Society of Optical Engineering
3 国際会議録 Recent trends and progress in deep-UV lithography Ronse,K., Goethals,A.M., Vandenberghe,G., Maenhoudt,M. SPIE - The International Society for Optical Engineering	9 国際会議録 60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography J. Bekaert, E. Hendrickx, G. Vandenberghe Society of Photo-optical Instrumentation Engineers
4 国際会議録 Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123] Yoshizawa, M., Philipsen, V., Leunissen, A. H. L., Hendrickx, E., Jonckheere, R., Vandenberghe, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering	10 国際会議録 Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM Kim,Y.-C., Vandenberghe,G.N., Verhaegen,S., Ronse,K. SPIE-The International Society for Optical Engineering
5 国際会議録 Extending ArF to the 65-nm node with full-phase lithography Driessen, F.A., Pierrat, C., Vandenberghe, G., Ronse, K.G., Adrichem, P., Liu, H.-Y. SPIE-The International Society for Optical Engineering	11 国際会議録 KrF lithography for 130 nm Finders,J., Schoot,J.B.van, Vanoppen,P., Dusa,M.V., Socha,R.J., Vandenberghe,G., Ronse,K. SPIE - The International Society for Optical Engineering
6 国際会議録 High-index materials for 193 nm immersion lithography John H. Burnett, Simon G. Kaplan, Eric L. Shirley, Paul J. Tompkins, James E. Webb SPIE - The International Society of Optical Engineering	12 国際会議録 Controlled contamination studies in 193-nm immersion lithography Newman, G., Sun, H. SPIE - The International Society of Optical Engineering

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