Blank Cover Image

Relaxation mechanism of SiGe thin film on SOI substrate

著者名:
Di, Z. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) and City Univ. of Hong Kong (Hong Kong China) )
Zhang, M. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) )
Liu, W. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) )
Zhu, M. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) and City Univ. of Hong Kong (Hong Kong China) )
Lin, C. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) )
Chu, P. K. ( City Univ. of Hong Kong (Hong Kong China) )
さらに 1 件
掲載資料名:
Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5774
発行年:
2004
開始ページ:
611
終了ページ:
615
総ページ数:
5
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457554 [0819457558]
言語:
英語
請求記号:
P63600/5774
資料種別:
国際会議録

類似資料:

1 国際会議録 Relaxed SiGe-on-insulator substrates through implanting oxygen into pseudomorphic SiGe/Si heterostructure

Zbang, M., An, Z., Wu, Y., Di, Z., Chu, P., Lin, C.

Electrochemical Society
7 国際会議録 THE HIGH TEMPERATURE STABILITY AND RELAXATION OF UHV/CVD SiGe THIN FILMS

Stiffler, S.R., Stanis, C.L., Goorsky, M.S., Chan, K.K.

Materials Research Society
2 国際会議録 Relaxation Mechanisms of Strained SiGe Films Bonded to High and Low Viscosity Oxides

Hobart, K.D., Kub, F.J., Fatemi, M., Twigg, M.E., Thompson, P.E., Kuan, T.S., Inoki, C.K.

Electrochemical Society
8 国際会議録 Structural and electricat properties of high-K Al2O3-ZrO2 gate dielectrics on SOI substrate

Ding, Y. F., Ye, G. S., Zhang, N. L., Zhu, M., Lin, C. L., Zhu, Z. Q.

SPIE - The International Society of Optical Engineering
3 国際会議録 Dependence of Negative Substrate Bias on the Optical and Electrical Properties of W-Doped Vanadium Dioxide Thin Films

M.D. Zhu, D.P. Zhang, Y. Liu, K. Yang, G.X. Liang

Trans Tech Publications
9 国際会議録 Dissipation Mechanisms in Thin-Film Silicon Microresonators on Glass Substrates

Gaspar, J., Chu, V., Conde, J. P.

Materials Research Society
4 国際会議録 Fabrication of SiGe-on-insulator and applications for strained Si (Invited Paper)

Lin, C., Liu, W., An, Z., Di, Z., Zhang, M.

SPIE - The International Society of Optical Engineering
10 国際会議録 Nonlinear optical properties of metal-nitride thin films

P.M. Lundquist, W. Lin, J.B. Ketterson, G.K. Wong, L.-D. Zhu

Society of Photo-optical Instrumentation Engineers
5 国際会議録 Studies on novel SOI-structure with MN film as buried insulator

Lin, C., Zhu, M., Men, C., An, Z., Zhang, M.

Electrochemical Society
11 国際会議録 Application of Thin-Film Micromachining for Large-Area Substrates

Boucinha, M., Chu, V., Conde, J. P., Soares, V.

Materials Research Society
6 国際会議録 Characterisation of SOI Thin Film Transistors Fabricated Using SiGe Etch Stop Layers

Uppal, S, Gay, D, Armstrong, G A, McNeill, D W, Baine, P, Armstrong, B M, Gamble, H S, Yallup, K

Electrochemical Society
12 国際会議録 Strain Relaxation in SiGe Thin Films Studied by Low-Energy Electron Microscopy

Woll, A.R., Moran, P., Rehder, E.M., Yang, B., Kuech, T.F., Lagally, M.G.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12