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DFM in practice: results of a three way partnership between a leading fabless design house, foundry, and EDA company to implement alternating-phase shift mask(Alt-PSM) on a 90-nm FPGA chip

著者名:
Yu, C. -C. ( UMC(Taiwan) )
Shieh, M. -F. ( UMC(Taiwan) )
Liu, E. ( UMC(Taiwan) )
Lin, B. ( UMC(Taiwan) )
Lin, H. ( Synopsys Inc. (USA) )
Chacko, M. ( Synopsys Inc. (USA) )
Li, X. ( Synopsys Inc. (USA) )
Lei, W. -K. ( Synopsys Inc. (USA) )
Ho, J. ( Xilinx Inc. (USA) )
Wu, X. ( Xilinx Inc. (USA) )
さらに 5 件
掲載資料名:
Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5756
発行年:
2005
開始ページ:
262
終了ページ:
273
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457363 [0819457361]
言語:
英語
請求記号:
P63600/5756
資料種別:
国際会議録

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