Real-time control of photoresist absorption coefficient uniformity

Real-time control of photoresist absorption coefficient uniformity

著者名:

Tay, A. ( National Univ. of Singapore(Singapore) )
Ho, W. -K. ( National Univ. of Singapore(Singapore) )
Wu, X. ( National Univ. of Singapore(Singapore) )
Tsai, K. -Y. ( Intel Corp. (USA) )

掲載資料名:

Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5755

発行年:

2005

開始ページ:

187

終了ページ:

195

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457356 [0819457353]

言語:

英語

請求記号:

P63600/5755

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014982
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2005 : 2nd
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.03-2005.03.04

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1 国際会議録 Real-time spatial control of photoresist development rate A. Tay, W. Ho, N. Hu, C. Kiew, K. Tsai SPIE - The International Society of Optical Engineering	7 国際会議録 In-situ Measurement and Control for Photoresist Processing in Microlithography Arthur Tay, Weng-Khuen Ho, Xiaodong Wu, Choon-Meng Kiew American Institute of Chemical Engineers
2 国際会議録 CD uniformity control via real-time control of photoresist properties M. Chen, J. Fu, W. K. Ho, A. Tay Society of Photo-optical Instrumentation Engineers	8 国際会議録 Real-time control of photoresist thickness uniformity during the bake process Lee,L.L., Schaper,C.D., Khuen,H.W. SPIE-The International Society for Optical Engineering
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5 国際会議録 Influence of wafer warpage on photoresist film thickness and extinction coefficient measurements X. Wu, A. Tay SPIE - The International Society of Optical Engineering	11 国際会議録 A lamp thermoelectricity based integrated bake/chill system for advanced photoresist processing [6153-175] Tay, A., Chua, H.-I., Wu, X., Wang, Y. SPIE - The International Society of Optical Engineering
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