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Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system

著者名:
Lin, W. ( United Microelectronics Corp. (Taiwan) )
Liao, S. ( United Microelectronics Corp. (Taiwan) )
Tsai, R. ( United Microelectronics Corp. (Taiwan) )
Yeh, M. ( United Microelectronics Corp. (Taiwan) )
Hsieh, C. ( United Microelectronics Corp. (Taiwan) )
Yu, Y. ( United Microelectronics Corp. (Taiwan) )
Lin, B. S. ( United Microelectronics Corp. (Taiwan) )
Fu, S. ( KLA-Tencor Corp. (Taiwan) )
Dziura, T. G. ( KLA-Tencor Corp. (USA) )
さらに 4 件
掲載資料名:
Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5755
発行年:
2005
開始ページ:
138
終了ページ:
144
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457356 [0819457353]
言語:
英語
請求記号:
P63600/5755
資料種別:
国際会議録

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