Double patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ-193nm
- 著者名:
- Maenhoudt, M. ( IMEC (Belgium) )
- Versluijs, J. ( IMEC (Belgium) )
- Struyf, H. ( IMEC (Belgium) )
- Olmen, J. Van ( IMEC (Belgium) )
- Hove, M. Van ( IMEC (Belgium) )
- 掲載資料名:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5754
- 発行年:
- 2005
- パート:
- 3
- 開始ページ:
- 1508
- 終了ページ:
- 1518
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- 言語:
- 英語
- 請求記号:
- P63600/5754
- 資料種別:
- 国際会議録
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