Mask enhancer technology for 45-nm node contact hole fabrication
- 著者名:
Yuito, T. ( IMEC (Belgium) and Matsushita Electric Industrial Co., Ltd. (Japan) ) Wiaux, V. ( IMEC (Belgium) ) Look, L. Van ( IMEC (Belgium) ) Vandenberghe, G. ( IMEC (Belgium) ) Irie, S. ( Matsushita Electric Industrial Co., Ltd. (Japan) ) Matsuo, T. ( Matsushita Electric Industrial Co., Ltd. (Japan) ) Misaka, A. ( Matsushita Electric Industrial Co., Ltd. (Japan) ) Watanabe, H. ( Matsushita Electric Industrial Co., Ltd. (Japan) ) Sasago, M. ( Matsushita Electric Industrial Co., Ltd. (Japan) ) - 掲載資料名:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5754
- 発行年:
- 2005
- パート:
- 3
- 開始ページ:
- 1377
- 終了ページ:
- 1387
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- 言語:
- 英語
- 請求記号:
- P63600/5754
- 資料種別:
- 国際会議録
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Improved outline phase shifting mask (OL-PSM) for reduction of the mask error enhancement factor
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Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
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