Development and evaluation of an F2 laser for immersion interference lithography at 157 nm

Development and evaluation of an F2 laser for immersion interference lithography at 157 nm

著者名:

Itakura, Y. ( Komatsu Ltd. (Japan) )

Kawasa, Y. ( Komatsu Ltd. (Japan) )

Wakabayashi, O. ( Komatsu Ltd. (Japan) )

Moriya, M. ( Komatsu Ltd. (Japan) )

Nagai, S. ( Komatsu Ltd. (Japan) )

Sumitani, A. ( Komatsu Ltd. (Japan) )

Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Tsuji, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Wakamiya, W. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

さらに 6 件

掲載資料名:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5754

発行年:

2005

パート:

3

開始ページ:

1269

終了ページ:

1278

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

言語:

英語

請求記号:

P63600/5754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014979
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2005 : 18th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.01-2005.03.04
論文注記:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

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2 国際会議録 Sub-40 nm pattern fabrication in 157 nm interferometric immersion lithography [6154-173] Hagiwara T, Tsuji S, Fujii, K, Moriya M, Wakabayashi O, Sumitani A, Saotp Y, Maeda K SPIE - The International Society of Optical Engineering	8 国際会議録 Current status of 157-nm lithography using a full-field scanner Ishimaru, T., Matsuura, S., Seki, M., Fujii, K., Koizumi, R., Hakataya, Y., Moriya, A. SPIE - The International Society of Optical Engineering
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4 国際会議録 Evaluation systems of F2 laser lithography materials Itakura, Y., Kawasa, Y., Egawa, K., Sumitani, A., Sasaki, H., Higasikawa, I., Irie, S., Fujii, K., Itani, T., Nakano, … SPIE - The International Society of Optical Engineering	10 国際会議録 Study of resist outgassing by F2 laser irradiation Itakura, Y., Kawasa, Y., Sumitani, A., Ishikawa, S., Irie, S., Itani, T. SPIE-The International Society for Optical Engineering
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