Current status of 157-nm lithography using a full-field scanner

Current status of 157-nm lithography using a full-field scanner

著者名:

Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Matsuura, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Seki, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Koizumi, R. ( Canon Inc. (Japan) )

Hakataya, Y. ( Canon Inc. (Japan) )

Moriya, A. ( Canon Inc. (Japan) )

さらに 2 件

掲載資料名:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5754

発行年:

2005

パート:

3

開始ページ:

1260

終了ページ:

1268

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

言語:

英語

請求記号:

P63600/5754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014979
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2005 : 18th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.01-2005.03.04
論文注記:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

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2 国際会議録 157-nm resist assessment by a full-field scanner Otoguro, A., Irie, S., Ishimaru, T., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	8 国際会議録 157-nm chromeless phase lithography for 45-nm SRAM gate Suganaga, T., Watanabe, K., Matsuura, S., Hagiwara, T., Furukawa, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
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