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Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node

著者名:
Winkler, T. ( Infineon Technologies AG (Germany) )
Dettmann, W. ( Infineon Technologies AG (Germany) )
Hennig, M. ( Infineon Technologies Dresden (Germany) )
Koestler, W. ( Infineon Technologies Dresden (Germany) )
Moukara, M. ( Infineon Technologies AG (Germany) )
Thiele, J. ( Infineon Technologies AG (Germany) )
Zeiler, K. ( Infineon Technologies AG (Germany) )
さらに 2 件
掲載資料名:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5754
発行年:
2005
パート:
1
開始ページ:
476
終了ページ:
487
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
言語:
英語
請求記号:
P63600/5754
資料種別:
国際会議録

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