Era of double exposure in 7O nm node DRAM cell
- 著者名:
Lim, C.-M. ( Hynix Semicondvctor Inc. (South Korea) ) Eom, T.-S. ( Hynix Semicondvctor Inc. (South Korea) ) Kim, S.-M. ( Hynix Semicondvctor Inc. (South Korea) ) Bok, C. ( Hynix Semicondvctor Inc. (South Korea) ) Ma, W.-K. ( Hynix Semicondvctor Inc. (South Korea) ) Park, G.-D. ( Hynix Semicondvctor Inc. (South Korea) ) Moon, S.-C. ( Hynix Semicondvctor Inc. (South Korea) ) Kim, J.-W. ( Hynix Semicondvctor Inc. (South Korea) ) - 掲載資料名:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5754
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 368
- 終了ページ:
- 376
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- 言語:
- 英語
- 請求記号:
- P63600/5754
- 資料種別:
- 国際会議録
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