Lithography manufacturing implementation for 65 nm and 45 nm nodes with model-based scattering bars using IML technology
- 著者名:
- Nam, D. ( Samsung Electronics Co. (South Korea) )
- Milster, T. D. ( Optical Sciences Ctr./Univ. of Arizona (USA) )
- Chen, T. ( Optical Sciences Ctr./Univ. of Arizona (USA) )
- 掲載資料名:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5754
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 355
- 終了ページ:
- 367
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- 言語:
- 英語
- 請求記号:
- P63600/5754
- 資料種別:
- 国際会議録
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1
国際会議録
Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
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