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Complementary dipole exposure solutions at 0.29 k1

著者名:
Heumann, J. ( Advanced Mask Technology Ctr. (Germany) )
Schramm, J. ( Advanced Mask Technology Ctr. (Germany) )
Birnstein, A. ( Advanced Mask Technology Ctr. (Germany) )
Park, K. T. ( DPI/Advanced Mask Technology Ctr, (Germany) )
Witte, T. ( Advanced Mask Technology Ctr. (Germany) )
Morgana, N. ( Infineon Technologies AG (Germany) )
Hennig, M. ( Infineon Technologies AG (Germany) )
Pforr, R. ( Infineon Technologies AG (Germany) )
Thiele, J. ( Infineon Technologies AG (Germany) )
Schmidt, N. ( KLA-Tencor Corp. (USA) )
Aquino, C. ( KLA-Tencor Corp. (USA) )
さらに 6 件
掲載資料名:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5754
発行年:
2005
パート:
1
開始ページ:
327
終了ページ:
338
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
言語:
英語
請求記号:
P63600/5754
資料種別:
国際会議録

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