A novel focus monitoring method using double side chrome mask

A novel focus monitoring method using double side chrome mask

著者名:

Cha, B.-C. ( Samsung Electronics (South Korea) )
Kim, Y.-H. ( Samsung Electronics (South Korea) )
Yoon, H.-S. ( Samsung Electronics (South Korea) )
Han, W.-S. ( Samsung Electronics (South Korea) )

掲載資料名:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5754

発行年:

2005

パート:

1

開始ページ:

303

終了ページ:

314

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

言語:

英語

請求記号:

P63600/5754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014979
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2005 : 18th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.01-2005.03.04
論文注記:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

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1 国際会議録 Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11] Yu, S.-Y., Kim, S.-H., Cha, B.-C., Kim, Y.-H., Choi, S.-W., Yoon, H.-S., Han, W.-S. SPIE - The International Society of Optical Engineering	7 国際会議録 Improved process control of photomask fabrication in e-beam lithography Cha,B.-C., Park,J.-H., Choi,Y.-H., Kim,J.-M., Han,W.-S., Yoon,H.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
2 国際会議録 Resolution enhancement with thin Cr for chrome mask making Cha,B.C., Choi,S.W., Kim,J.M., Cho,H.J., Sohn,J.M. SPIE-The International Society for Optical Engineering	8 国際会議録 Evaluation of the practical use of GHOST technique for various e-beam resists Cha,B.-C., Kim,J.-M., Kim,B.-G., Choi,S.-W., Yoon,H.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering
3 国際会議録 Feasibility study of mask fabrication in double exposure technology [6349-67] Doh, J. G., Lee, S. H., Yoon, J. B., Lee, D. Y., Cho, S. Y., Kim, B. G., Choi, S. W., Han, W. S. SPIE - The International Society of Optical Engineering	9 国際会議録 EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering
4 国際会議録 Correction method for radial effect caused by spin process Kim,J.-M., Choi,S.-W., Cha,B.-C., Yoon,H.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	10 国際会議録 Fully optical backplane system using novel optical plug aand slot [6014-19] Cho I.-K., Ahn S.-H., Lee W.-J., Han S.-H., Kim J.-T., Choi C.-K., Shin K., Yoon K. B., Jeong M.-Y., Park H. H. SPIE - The International Society of Optical Engineering
5 国際会議録 Dose latitude dependency on resist contrast in e-beam mask lithography Cha,B.-C., Moon,S.-Y., Ki,W.-T., Yang,S.-H., Choi,S.-W., Han,W.-S., Yoon,H.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering	11 国際会議録 Optical proximity correction using a transmittance-controlled mask (TCM) W.-S. Han, C.-J. Sohn, Y.-B. Kim, K.-H. Kim, H.-K. Kang Society of Photo-optical Instrumentation Engineers
6 国際会議録 Analysis of in-field uniformity on wafer considering exposure margin and MEEF Cha, B. -C., Kim, S. -Y., Kim, S. -H., Yu, S. -Y., Jeon, C. -U., Yoon, H. -S., Han, W. -S. SPIE - The International Society of Optical Engineering	12 国際会議録 Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes Choi, Y.-H., Park, J.R., Sung, M.-G., Yang, S.-H., Kim, S.-H., Lee, H.-J., Lee, J.-Y., Jang, I.Y., Kim, Y.H., Choi, … SPIE-The International Society for Optical Engineering

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