Blank Cover Image

Resist blur and line edge roughness (Invited Paper)

著者名:
Zhang, G. ( Texas Instruments Inc. (USA) )
Terry, M. ( Texas Instruments Inc. (USA) )
O'Brien, S. ( Texas Instruments Inc. (USA) )
Soper, R. ( Texas Instruments Inc. (USA) )
Mason, M. ( Texas Instruments Inc. (USA) )
Kim, W. ( Texas Instruments Inc. (USA) )
Wang, C. ( Texas Instruments Inc. (USA) )
Hansen, S. ( ASML (USA) )
Lee, J. ( ASML (USA) )
Ganeshan, J. ( ASML (USA) )
さらに 5 件
掲載資料名:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5754
発行年:
2005
パート:
1
開始ページ:
38
終了ページ:
52
総ページ数:
15
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
言語:
英語
請求記号:
P63600/5754
資料種別:
国際会議録

類似資料:

1 国際会議録 65nm node gate pattern using attenuated phase shift mask with off-axis illumination and sub-resolution assist features

Gary Zhang, Mark Terry, Sean O'Brien, Robert Soper, Mark Mason, Won Kim, Changan Wang, Steven Hansen, Jason Lee, Joe …

SPIE - The International Society of Optical Engineering
7 国際会議録 Surface conditioning solutions to reduce resist line roughness

Zhang, P., Jaramillo, M., Jr., Rao, M.B., Yates, C., King, D.M., Ross, B.F., O'Brien, B.L.

SPIE - The International Society of Optical Engineering
2 国際会議録 Improving asymmetric printing and low margin using custom illumination for contact hole lithography [6156-62]

Jessen, S, Terry, M., Mason, M., O’Brien, S., Soper, R., Yarbrough, W., Wolf, T.

SPIE - The International Society of Optical Engineering
8 国際会議録 Characterization of line edge roughness using CD-SAXS [6152-23]

Jones, R.J., Wu, W., Wang, C., Lin, E. K., Choi, K., Rice, B. J., Thompson, G. M., Weigand, S. J., Keane, D. T

SPIE - The International Society of Optical Engineering
3 国際会議録 Photonic crystal lasers(Invited Paper)

O'Brien, J.D., Lee, P.-T., Cao, J.-R., Kuang, W., Kim, C., Kim, W.-J., Yang, T., Choi, S.-J., Dapkus, P.D.

SPIE-The International Society for Optical Engineering
9 国際会議録 Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

T. Wallow, A. Acheta, Y. Ma, A. Pawloski, S. Bell, B. Ward, C. Tabery, B. L. Fontaine, R. Kim, S. McGowan, H. J. …

SPIE - The International Society of Optical Engineering
4 国際会議録 Design rule considerations for 65-nm node contact using off axis illumination

Jessen, S., Mason, M., O'Brien, S., Terry, M., Soper, R., Wolf, T.

SPIE - The International Society of Optical Engineering
10 国際会議録 Improvement of line edge roughness by employing new PAG

Kim, Y.-S., Kim, Y.-H., Lee, S.-H., Yim, Y.-G., Kim, D,-B., Kim, J.-H.

SPIE-The International Society for Optical Engineering
5 国際会議録 Rules based process window OPC

S. O'Brien, R. Soper, S. Best, M. Mason

Society of Photo-optical Instrumentation Engineers
11 国際会議録 Growth of nanotubes and chemical sensor applications (Invited Paper)

Hone, J., Kim, P., Huang, X. M. H., Chandra, B., Calawell, R., Small, J., Hong, B. H., Someya, T., Huang, L., O'Brien, …

SPIE - The International Society of Optical Engineering
6 国際会議録 Finding the needle in the haystack: using full-chip process window analysis to qualify competing SRAF placement strategies for 65 nm [6349-70]

Mason, M., Best, S., Zhang, G., Terry, M., Soper, R.

SPIE - The International Society of Optical Engineering
12 国際会議録 Photonic crystal devices (Invited Paper)

O'Brien, J. D., Kuang, W., Shih, M. -H., Bagheri, M., Cao, J. R., Choi, S. J., Dapkus, P. D.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12