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Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

著者名:
Lee, C. H. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, K. S. ( Samsung Electronics Co., Ltd. (South Korea) )
Kang, H. Y. ( Hanyang Univ. (South Korea) )
Oh, H. W. ( Hanyang Univ. (South Korea) )
Lee, J. E. ( Hanyang Univ. (South Korea) )
Kim, K. M. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, Y. H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, T. S. ( Samsung Electronics Co., Ltd. (South Korea) )
Oh, H.-K. ( Hanyang Univ. (South Korea) )
さらに 5 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
564
終了ページ:
571
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

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