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A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists

著者名:
Houlihan, F. ( AZ Electronic Materials (USA) )
Sakamuri, R. ( AZ Electronic Materials (USA) )
Hamilton, K. ( AZ Electronic Materials (USA) )
Dimerli, A. ( AZ Electronic Materials (USA) )
Rentkiewicz, D. ( AZ Electronic Materials (USA) )
Romano, A. ( AZ Electronic Materials (USA) )
Dammel, R. R. ( AZ Electronic Materials (USA) )
Wei, Y. ( Infineon Technologies (USA) )
Stepanenko, N. ( Infineon Technologies AG (Germany) )
Sebald, M. ( Infineon Technologies AG (Germany) )
Hohle, C. ( Infineon Technologies AG (Germany) )
Conley, W. ( SEMATECH, Inc. (USA) )
Miller, D. ( SEMATECH, Inc. (USA) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Shigematsu, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kawaguchi, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
さらに 11 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
554
終了ページ:
563
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

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