Anti-bubble topcoat for immersion lithography
- 著者名:
Paulsson, A. ( Micronic Laser Systems AB (Sweden) ) Xing, K. ( Micronic Laser Systems AB (Sweden) ) Fosshaug, H. ( Micronic Laser Systems AB (Sweden) ) Lundvall, A. ( Micronic Laser Systems AB (Sweden) ) Bjornberg, C. ( Micronic Laser Systems AB (Sweden) ) Karlsson, J. ( Micronic Laser Systems AB (Sweden) ) - 掲載資料名:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5753(1)
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 527
- 終了ページ:
- 536
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- 言語:
- 英語
- 請求記号:
- P63600/5753-1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
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9
国際会議録
The effect of photoresist/topcoat properties on defect formation in immersion lithography [6153-59]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
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国際会議録
Resolution enhanced top anti-reflective coating materials for ArF immersion lithography [6153-74]
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