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Electron beam direct write process development for sub 45nm CMOS manufacturing

著者名:
Zhang, P. ( Air Products and Chemicals, Inc. (USA) )
Jaramillo, M. Jr. ( Air Products and Chemicals, Inc. (USA) )
Rao, M. B. ( Air Products and Chemicals, Inc. (USA) )
Ross, B. ( Air Products and Chemicals, Inc. (USA) )
Horvath, B. ( Air Products and Chemicals, Inc. (USA) )
Wong, P. ( ASML (Netherlands) )
Gehoel, W. ( ASML (Netherlands) )
Sinkwitz, S. ( ASML (Netherlands) )
さらに 3 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
408
終了ページ:
416
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

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