The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness
- 著者名:
Chapman, G. ( Simon Fraser Univ. (Canada) ) Poon, D. ( Simon Fraser Univ. (Canada) ) Choo, C. ( Simon Fraser Univ. (Canada) ) Tu, Y. ( Simon Fraser Univ. (Canada) ) Dykes, J. ( Simon Fraser Univ. (Canada) ) Wang, J. ( Simon Fraser Univ. (Canada) ) Peng, J. ( Simon Fraser Univ. (Canada) ) Lennard, W. ( The Univ. of Western Ontario (Canada) ) Kavanagh, K. ( Simon Fraser Univ. (Canada) ) - 掲載資料名:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5753(1)
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 368
- 終了ページ:
- 379
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- 言語:
- 英語
- 請求記号:
- P63600/5753-1
- 資料種別:
- 国際会議録
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