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New shrinkage technology for nano-contact hole formation

著者名:
Oh, S. K. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. Y. ( Dongjin Semichem Co., Ltd. (South Korea) )
Jung, Y. H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Lee, J. W. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, D. B. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) )
Lee, G. S. ( Hynix Semiconductor Inc. (South Korea) )
Lee, S. K. ( Hynix Semiconductor Inc. (South Korea) )
Ban, K. D. ( Hynix Semiconductor Inc. (South Korea) )
Jung, J. C. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C. K. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S. C. ( Hynix Semiconductor Inc. (South Korea) )
さらに 7 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
181
終了ページ:
186
総ページ数:
6
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

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