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A new 193nm resist

著者名:
Hirayama, T. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Shiono, D. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Matsumaru, S. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Ogata, T. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Hada, H. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Onodera, J. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) )
Arai, T. ( Hitachi, Ltd. (Japan) )
Sakamizu, T. ( Hitachi, Ltd. (Japan) )
Yamaguchi, A. ( Hitachi, Ltd. (Japan) )
Shiraishi, H. ( Hitachi, Ltd. (Japan) )
Fukuda, H. ( Hitachi, Ltd. (Japan) )
Ueda, M. ( Tokyo Institute of Technology (Japan) )
さらに 7 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
122
終了ページ:
130
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

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