A new 193nm resist
- 著者名:
Hirayama, T. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) ) Shiono, D. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) ) Matsumaru, S. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) ) Ogata, T. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) ) Hada, H. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) ) Onodera, J. ( Tokyo Ohka Kogyo C0., Ltd. (Japan) ) Arai, T. ( Hitachi, Ltd. (Japan) ) Sakamizu, T. ( Hitachi, Ltd. (Japan) ) Yamaguchi, A. ( Hitachi, Ltd. (Japan) ) Shiraishi, H. ( Hitachi, Ltd. (Japan) ) Fukuda, H. ( Hitachi, Ltd. (Japan) ) Ueda, M. ( Tokyo Institute of Technology (Japan) ) - 掲載資料名:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5753(1)
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 122
- 終了ページ:
- 130
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- 言語:
- 英語
- 請求記号:
- P63600/5753-1
- 資料種別:
- 国際会議録
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