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Resist component leaching in 193-nm immersion lithography

著者名:
Chapon, J.-D. ( STMicroelectronics (France) )
Chaton, C. ( CEA-LETI (France) )
Gouraud, P. ( STMicroelectronics (France) )
Broekaart, M. ( Philips Semiconductors (France) )
Warrick, S. ( Freescale Semiconductor, Inc. (France) )
Guilmeau, I. ( CEA-LETI (France) )
Trauiller, Y. ( CEA-LETI (France) )
Belledent, J. ( Philips Semiconductors (France) )
さらに 3 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
95
終了ページ:
101
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

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