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Study and control of the interfacial mass transfer of resist components in 193-nm immersion lithography

著者名:
Ganesan, R. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Choi, J.-H. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Yun, H.-J. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Kwon, Y.-G. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Kim, K.-S. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Oh, T.-H. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
Kim, J.-B. ( Korea Advanced Instifute of Sclence and Technology (South Korea) )
さらに 2 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
40
終了ページ:
51
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

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