Blank Cover Image

Water distribution within immersed polymer films

著者名:
Kang, Y. ( Samsung Elecfronics Co., Ltd. (South Korea) )
Hong, J. ( Samsung Elecfronics Co., Ltd. (South Korea) )
Lee, S.-Y. ( Samsung Elecfronics Co., Ltd. (South Korea) )
Lee, H.-R. ( Samsung Elecfronics Co., Ltd. (South Korea) )
Ryoo, M.-H. ( Samsung Elecfronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Elecfronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Elecfronics Co., Ltd. (South Korea) )
Moon, J.-T. ( Samsung Elecfronics Co., Ltd. (South Korea) )
さらに 3 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
31
終了ページ:
39
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

類似資料:

1 国際会議録 Defect inspection of EUVmask blank using confocal microscopy: simulation and experiment [6151-49]

Kim, S. S., Park, J., Chalykh, R., Kang, J., Lee, S., Woo, S. G., Cho, H. K., Moon, J. T.

SPIE - The International Society of Optical Engineering
7 国際会議録 Macro analysis of line edge and line width roughness [6152-33]

Shin, J., Yoon, J., Jung, Y., Lee, S., Woo, S. G., Cho, H. -K., Moon, J. -T.

SPIE - The International Society of Optical Engineering
2 国際会議録 Spin-on hard mask with dual-BARC property for 50-nm devices [6153-21]

Hah, J H, Chae, Y S, Jang Y K, Ryoo, M, Choi, S J, Woo, S G, Cho, H K, Moon, J T

SPIE - The International Society of Optical Engineering
8 国際会議録 Realization of sub-80-nm small-space patterning in ArF photolithography

Kim, S.-H., Kim, H.-D., Lee, S.-H., Park, C.-M., Ryoo, M.-H., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, …

SPIE - The International Society of Optical Engineering
3 国際会議録 A Correlation Between Film Property and Chemical Structure of PECVD Silicon Nitride Deposited on GaAs

J. W. Lee, K. I Cho, R. Ryoo, M. S. Jhon

Electrochemical Society
9 国際会議録 Analysis method to determine and characterize the mask mean-to-target and uniformity specification [6281-55]

Lee, -W. S., Leunissen, A. H. L., Van de Kerhove, J., Philipsen, V., Jonckheere, R., Lee, -J. S., Woo, -G. S., Cho, -K. …

SPIE - The International Society of Optical Engineering
4 国際会議録 Pattern asymmetry correction using assist patterns

Ryoo,M., Nam,D., Cho,H., Moon,J., Lee,S.

SPIE - The International Society for Optical Engineering
10 国際会議録 First microprocessors with immersion lithography

Lee, D.-Y., Kim, I.-S., Jung, S.-G., Jung, M.-H., Park, J.-O., Oh, S.-H., Woo, S.-G., Cho, H.-K., Moon, J.-T.

SPIE - The International Society of Optical Engineering
5 国際会議録 Simulation and experiments for inspection properties of EUV mask defects [6283-85]

Park, J., Kim, -S. S., Lee, S., Woo, -G. S., Cho, -K. H., Moon, -T. J.

SPIE - The International Society of Optical Engineering
11 国際会議録 Statistical analysis of CD-SEM measurement and process control in the indistinguishable multi-process patterns [6152-100]

Yang, D. S., Jung, M. H., Lee, Y. M., Koh, C. W., Yeo, G. S., Woo, S. G., Cho, H. K., Moon, J. T.

SPIE - The International Society of Optical Engineering
6 国際会議録 Requirement of in-field illumination control for low k1 imaging below 0.3

Hwang, C., Shin, J., Lee, S.-J., Woo, S.-G., Cho, H.-K., Moon, J.-T.

SPIE - The International Society of Optical Engineering
12 国際会議録 Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Lee, J.-Y., Shin, J., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12