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Automated CD SEM tilt-ready for primetime: a fast in-line methodology for differentiating lines vs. spaces

著者名:
Choi, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Sung, M.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.-H. ( SungKyunKwan Univ. (South Korea) )
Park, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, I.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, S.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 4 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5752
発行年:
2005
開始ページ:
351
終了ページ:
362
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457325 [0819457329]
言語:
英語
請求記号:
P63600/5752-1
資料種別:
国際会議録

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