Blank Cover Image

AFM measurement of linewidth with sub-nanometer scale precision

著者名:
Tseng, H. T. ( United Microelectronics Corp. (Taiwan) )
Lin, L.-C. ( United Microelectronics Corp. (Taiwan) )
Huang, I. H. ( United Microelectronics Corp. (Taiwan) )
Lin, B. S.-M. ( United Microelectronics Corp. (Taiwan) )
Huang, C.-C. K. ( KLA-Tencor Corp. (USA) )
Huang, C.-J. ( KLA-Tencor Corp. (USA) )
さらに 1 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5752
発行年:
2005
開始ページ:
156
終了ページ:
162
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457325 [0819457329]
言語:
英語
請求記号:
P63600/5752-1
資料種別:
国際会議録

類似資料:

1 国際会議録 Investigation on the mechanism of the 193-nm resist linewidth reduction during the SEM measurement

Wu,C.-H.J., Huang,W.-S., Chen,K.-J.R., Archie,C.N., Lagus,M.E.

SPIE-The International Society for Optical Engineering
7 国際会議録 Characterization of linewidth variation on 248- and 193-nm exposure tools

Gabor,A.H., Brunner,T.A., Chen,J., Chen,N., Deshpande,S., Ferguson,R.A., Horak,D.V., Holmes,S.J., Liebmann,L.W., …

SPIE-The International Society for Optical Engineering
2 国際会議録 Compact high-resolution homodyne interferometer for nanometer-scale multidimensional AFM metrology

Gonda, S., Kinoshita, K., Noguchi, H., Koyanagi, H., Terasawa, T.

SPIE - The International Society of Optical Engineering
8 国際会議録 Sub-band denoising and spline curve fitting method for hemodynamic measurement in perfusion MRI

Lin, H.-D., Huang, H.-L., Hsu, Y.-Y., Chen, C.-C., Chen, I.-Y., Wu, L.-C., Liu, R.-S., Lin, K.-P.

SPIE-The International Society for Optical Engineering
3 国際会議録 Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning

Hung,K.-C., Lin,B.S.-M., Chang,H.-A., Tseng,A., Chung,L.-S., Liu,W.-J., Wu,D.-Y., Huang,P.

SPIE - The International Society for Optical Engineering
9 国際会議録 Depth-of-focus (DOF) and line-width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography

B. J. Lu, Y. Huang, H. T. Tseng, C. C. Yu, L. Meng, M. Liao, M. Legenza

SPIE - The International Society of Optical Engineering
4 国際会議録 Practical approach for AAPSM image imbalance correction for sub-100-nm lithography

Cho, H.L., Lin, S.Y., Hsieh, F., Kroyan, A., Liu, H.-Y., Huang, J.H., Hsu, S.-H., Huang, I-H., Lin, B.S.-M., Hung, K.-C.

SPIE-The International Society for Optical Engineering
10 国際会議録 SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE

Peterson, J., Barnett, J., Young, C., Hou, A., Gutt, J., Gopalan, S., Lee, C.H., Li, H.J., Moumen, N., Chaudhary, N., …

Electrochemical Society
5 国際会議録 Measurement of the spatial evolution of the deprotection reaction front with nanometer resolution using neutron reflectometry

Lin, E.K., Soles, C.L., Goldfarb, D.L., Trinque, B.C., Burns, S.D., Jones, R.L., Lenhart, J.L., Angelopoulos, M., …

SPIE-The International Society for Optical Engineering
11 国際会議録 Accurate in-line CD metrology for nanometer semiconductor manufacturing [6152-26]

Perng, B. C., Shieh, J. H., Jang, S. M., Liang, M.-S., Huang, R., Chen, L. C, Hwang, R. L., Hsu, J, Fong, D.

SPIE - The International Society of Optical Engineering
6 国際会議録 Layered Semiconductors as Materials for (Sub) Nanometer Scale Surface Modification with the STM

Fuchs H., Schimmel Th., Akari S., Eng M. L., Anders M., Lux-Steiner M., Dransfeld K.

Kluwer Academic Publishers
12 国際会議録 Direct measurement of the linewidth of relief element on AFM in nanometer range

Yu. A. Novikov, M. N. Filippov, I. D. Lysov, A. V. Rakov, V. A. Sharonov

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12