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Uniformity-improving dummy structures for deep reactive ion etching (DRIE) processes

著者名:
掲載資料名:
Micromachining and Microfabrication Process Technology X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5715
発行年:
2005
開始ページ:
39
終了ページ:
46
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456892 [0819456896]
言語:
英語
請求記号:
P63600/5715
資料種別:
国際会議録

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