Volume-change thermal-lithography technique for ultra-high density optical ROM mastering process(Invited Paper)

Volume-change thermal-lithography technique for ultra-high density optical ROM mastering process(Invited Paper)

著者名:

Kuwahara, M. ( National Institute of Advanced Industrial Science and Technology(Japan) )
Kim, J. ( Samsung Electronics Co. , Ltd. (South Korea) )
Yoon, D. ( Samsung Electronics Co. , Ltd. (South Korea) )
Tominaga, J. ( National Institute of Advanced Industrial Science and Technology(Japan) )

掲載資料名:

Fifth International Symposium on Laser Precision Microfabrication : 11-14 May, 2004, Nara, Japan

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5662

発行年:

2004

開始ページ:

51

終了ページ:

56

総ページ数:

6

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819456236 [0819456233]

言語:

英語

請求記号:

P63600/5662

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014879
シリーズID:	PA00000029
会議名:	International Symposium on Laser Precision Microfabrication
回次:	2004 : 5th
会議開催地:	Nara, Japan
会議開催年:	2004.05.11-2004.05.14

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