Increasing post OPC layout verification coverage using a full-chip simulation based verification method
- 著者名:
- Hung, C.-Y. ( Semiconductor Manufacturing International Corp. (China) )
- Wang, Y. D. ( Synopsys, Inc. (China) )
- Deng, Z. X. ( Semiconductor Manufacturing International Corp. (China) )
- Gao, G. S. ( Semiconductor Manufacturing International Corp. (China) )
- Fan, M. H. ( Synopsys, Inc. (USA) )
- 掲載資料名:
- Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5645
- 発行年:
- 2004
- 開始ページ:
- 315
- 終了ページ:
- 319
- 総ページ数:
- 5
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819456007 [0819456004]
- 言語:
- 英語
- 請求記号:
- P63600/5645
- 資料種別:
- 国際会議録
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