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Imaging simulation of maskless lithography using a DMD

著者名:
Liu, C. ( Sichuan Univ. (China) )
Guo, X. ( Sichuan Univ. (China) )
Gao, F. ( Sichuan Univ. (China) )
Luo, B. ( Sichuan Univ. (China) )
Duan, X. ( Sichuan Univ. (China) )
Du, J. ( Sichuan Univ. (China) )
Qiu, C. ( State Key Lab. of Optical Technology on Microfabrication, CAS (China) )
さらに 2 件
掲載資料名:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5645
発行年:
2004
開始ページ:
307
終了ページ:
314
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
言語:
英語
請求記号:
P63600/5645
資料種別:
国際会議録

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