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Resolution enhancement in optical lithography with chromium wire-grid polarization mask

著者名:
  • Yu, G. ( Institute of Optics and Electronics, CAS (China) )
  • Lin, W. ( Institute of Optics and Electronics, CAS (China) )
  • Xing, T. ( Institute of Optics and Electronics, CAS (China) )
  • Yao, H. ( Institute of Optics and Electronics, CAS (China) )
掲載資料名:
Advanced microlithography technologies : 8-10 November, 2004, Beijing, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5645
発行年:
2004
開始ページ:
122
終了ページ:
129
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819456007 [0819456004]
言語:
英語
請求記号:
P63600/5645
資料種別:
国際会議録

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